Shallow Silicided Junctions Formed by Dopant Redistribution of As~+ and BF_2~+ Implanted into CoSi_2

  • CoSi2中As~+和BF2~+注入杂质再分布形成硅化物化浅结性能研究

  • 互联网摘选 2025-01-20 12:32:27

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