CN x films were deposited on the Si ( 100 ) substrates with microwave plasma CVD method.

  • 沉积在Si ( 100 ) 基片上的CNx膜是用微波等离子体化学气相沉积法(MWPCVD)制备的.

  • 互联网摘选 2025-01-20 13:17:33

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