Based on the optimized conditions, plasma assisted PLD technology was employed to nitrogenize the Si ( 111) surface via nitrogen plasma prior to growth of high quality ZnO film.

  • 在此基础上,采用等离子体辅助PLD技术,氮化处理Si(111)表面,之后生长高质量ZnO薄膜。

  • 互联网摘选 2025-01-20 18:57:21

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