A resistance macromodel for deep-submicron process epi-type substrate based on the 2 D device simulation is presented.

  • 摘要提出了一种基于二维器件模拟的深亚微米工艺外延型衬底的电阻宏模型.

  • 互联网摘选 2025-01-18 13:41:29

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