The gibberellins interact also with photoperiod in the determination of flowering.

Photoperiod could affect the nutrient uptake and utilization in maize.

光周期可以影响玉米对养分的吸收及利用.

What is the adaptive significance of photoperiodism during evolution?

在演化过程中生物或植物以光周期适应(环境)之意义为何?

But there were obvious spring and strong photoperiodism spike cultivars . These need to improvement.

近期育成的大穗品种多有明显的春性化、强感光性, 需要加以改进.

The woman presented with photophobia and reduced vision.

该妇女表现为畏光和视力下降.

Severe water stress inhibited photosynthetic quantum yield, carboxylation efficiency, electron transport rate, and photophosphorylation activity.

叶肉细胞光合能力的降低可能是由于光合量子效率 、 化效率 、 合电子传递速率及光合磷酸化活力的下降所致.

The production of ATP from the transport of electrons excitedelectron transport chain is termed photophosphorylation.

由电子传递链偶连产生ATP的过程称为光合磷酸化.

This is more than 75 scleroscope hardness of a plastic, photopolymer plate.

这是肖氏硬度75以上的铅版塑料版 、 平聚版无法比拟的.

An extension of photorealism in which depiction of a subject is indistinguishable from reality.

20世纪末兴起的一种绘画流派.照相现实主义的延伸. 强调对现实的临摹.

We also discuss the implements of texture and light in terrain rendering to achieve photorealism effect.

本文还讨论了材质与光照在地形绘制系统中的作用以及实现方法.

ObjectiveTo observe the ultrastructural alterations photoreceptor in inherited retinal degeneration in rats.

目的观察遗传性视网膜变性大鼠视细胞超微结构改变.

Objective The retinal pigment epithelium ( RPE ) is a vital tissue for the maintenance of photoreceptor function.

目的:视网膜色素上皮 ( RPE ) 是维持视网膜结构和功能稳定性的重要细胞.

This paper introduces a chemically amplified photoresist appropriate for argon ion laser direct imaging.

本文介绍一种氩离子激光直接成像化学增幅感光树脂.

This photoresist have thermal stabilityand high resolution.

该光刻胶具有热稳定性和高分辨率性.

We have developed a method to measure the glass transition temperature of photoresist in situ.

我们研究出了一种方法来测量光刻胶玻璃的过渡温度.

Therefore, organic pigment must to be fine and symmetrical in the photoresist.

因此, 有机颜料必须以微细、均匀的状态存在于光阻剂中.

In the paper diazonaphthoquinone positive photoresist composition for LCD was studied.

文章是有关用于LCD的重氮萘醌系正性抗蚀剂的研究.

The mathematics model that showed photoresist spin coating thickness evolvement on spherical surface was put forward.

提出了球面旋涂微米级厚度光刻胶膜层薄化率公式及径向位置演变公式,并得到了膜厚分布的演变公式.

Methacrylate photoresist was one of the tradition photoresists and it had high transparent and resolution.

甲基丙烯酸树脂光刻胶是传统的光刻胶之一,具有高度的透明性及分辨率.

This paper reports a simple process using photoresist as sacrificial layers to fabricate movable microstructures.

报道了用光致抗蚀剂作牺牲层材料制作可动微机械结构的一种新技术.

EBR did not influence photorespiration.

EBR未导致光呼吸的变化.