Two different W interlay/ substrate bonding interfaces for the adhesion of diamond film deposited on WC-Co substrate were investigated using bias enhancing nucleation method, in microwave plasma enhanced chemical vapor deposition ( MWCVD) device.

  • 在微波等离子体化学气相沉积装置中,采用负偏压形核等方法,研究两种不同的W过渡层/基体结合界面对金刚石薄膜与WC6%Co附着力的影响。

  • 互联网摘选 2025-01-20 12:16:05

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