A cerium dioxide target was used for sputtering and films were deposited at various substrate temperature under different sputtering power.

  • 溅射过程中,首先制备纯二氧化铈靶材,然后在不同的功率上调节不同的基片温度进行溅射。

  • 互联网摘选 2025-01-20 12:31:18

    • 相关例句
    精确
    • 模糊
    • 词首
    • 词尾
    • 词义
    • 例句