For the grooved gate PMOSFET, the study results prove that with the increase of channel doping density, the threshold voltage increases, the drain current driving ability decreases, and the hot carrier effect is suppressed, as in the planar device.

  • 研究发现,随着沟道掺杂浓度的提高,与平面器件相同,槽栅器件的阈值电压提高,漏极驱动能力降低,抗热载流子效应增强;

  • 互联网摘选 2025-01-20 12:32:27

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