The photoresist sample prepared was evaluated by SEMATECH. Its best resolution is 0.1 μ m, the minimun exposure dose is 26 mJ/ cm2; it has not only excellent resolution and photosensitivity, but also good adhesiveness and anti-dry etching.

  • 研制出的样品经美国SEMATECH实验室应用评价其最佳分辨率为0.1μm,最小曝光量为26mJ/cm2,不但具有优异的分辨率和光敏性,而且还具有良好的粘附性和抗干法腐蚀性。

  • 互联网摘选 2025-01-20 13:02:55

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