X ray lithography ( XRL) is a very important batch exposure technology in micro/ nanometer lithography. The development of XRL requires new X ray source, new type of stepper, new X ray masks and advanced related processing technology.

  • X-ray光刻(XRL)是微/纳米光刻技术中至关重要的批量复制技术,XRL的发展在于不断对X-ray源、新型的stepper、X线掩模版以及相关处理工艺的研究进展。

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