The behaviors of the channel hot electron ( CHE) stress at high temperature in LDD NMOSFET are studied and it is found that there is a linear correlation between SILC degradation and Vth degradation in NMOSFET during CHE stress.

  • 对LDD nMOSFET中的高温沟道热电子应力特性进行了研究,发现高温沟道热载流子应力中SILC的退化和Vth的退化存在线性关系。

  • 互联网摘选 2025-01-20 17:34:51

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