The mechanisms of dissolution inhibition of positive photoresist based on novolak ( NVK)-diazonaphthoquinone ( DNQ), including ( 1) the molecular hydrogen bonding interactions between novolak and DNQ;

  • 本文综述了酚醛重氮萘醌正性抗蚀剂的溶解抑制机理,主要包括(1)分子间氢键作用机理;

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