photoresist

This paper introduces a chemically amplified photoresist appropriate for argon ion laser direct imaging.

本文介绍一种氩离子激光直接成像化学增幅感光树脂.

Therefore, organic pigment must to be fine and symmetrical in the photoresist.

因此, 有机颜料必须以微细、均匀的状态存在于光阻剂中.

This paper reports a simple process using photoresist as sacrificial layers to fabricate movable microstructures.

报道了用光致抗蚀剂作牺牲层材料制作可动微机械结构的一种新技术.

We have developed a method to measure the glass transition temperature of photoresist in situ.

我们研究出了一种方法来测量光刻胶玻璃的过渡温度.

In the paper diazonaphthoquinone positive photoresist composition for LCD was studied.

文章是有关用于LCD的重氮萘醌系正性抗蚀剂的研究.

Methacrylate photoresist was one of the tradition photoresists and it had high transparent and resolution.

甲基丙烯酸树脂光刻胶是传统的光刻胶之一,具有高度的透明性及分辨率.

This photoresist have thermal stabilityand high resolution.

该光刻胶具有热稳定性和高分辨率性.

The mathematics model that showed photoresist spin coating thickness evolvement on spherical surface was put forward.

提出了球面旋涂微米级厚度光刻胶膜层薄化率公式及径向位置演变公式,并得到了膜厚分布的演变公式.