Titanium films are deposited on Si wafers by electron-beam evaporation in vacuum, the base pressure of the system is 10-7 Torr. Solid phase reaction results through rapid thermal annealing.

  • 钛膜在10~(-7)Torr真空中用电子束蒸发沉积在硅单晶片上,以快速热退火方式进行团相反应。

  • 互联网 2025-03-09 10:27:30

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