magnetron的例句大全

Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.

Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.

利用低频反应磁控溅射制备五氧化二铌光学薄膜.

The generator represents magnetron, packaged with constant magnets in ceramic-metal execution.

该磁控管采用金属陶瓷封装,装有永磁体.

The kinetic process of reactive magnetron sputtering has been studied.

研究了反应磁控溅射的动力学过程.

Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.

采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.

Si rich SiO 2 films have been prepared by a rf magnetron sputter method.

用射频磁控溅射法制备了富硅二氧化硅薄膜.

In the fourth chapter Sb-doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.

第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.

Suitable for making heating element for electrical oven and magnetron.

适用于制作电气炉发热元件等.

The generator represents magnetron , packaged with constants and electromagnets ( 2 coils magnetic ) in the magnetic-shielded ceramic-metal execution.

该磁控管的设计采用电磁石,封装采用金属陶瓷.

The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.

利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.

Methods: The nature HA films were prepared by electron beam evaporation and rf-magnetron sputtering techniques.

方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.

Its principle and some other aredescribed, including the magnetron sputter coater and the osmium plasma coater.

本文将主要叙述等离子溅射镀膜的原理与方法,并且简单介绍磁控管溅射仪和锇等离子镀膜仪等.

Ti-O film was prepared by microwave-electron convolute resonance ( MW-ECR ) magnetron filter arc deposition process.

采用微波电子回旋 共振 磁过滤弧设备制备钛氧薄膜.

Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .

采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.

Magnetron is often used as microwave power source in clinical linac magnetron.

在医用直线加速器中通常都采用磁控管作为微波功率源.

Calculation and simulation analysis of A6 relativistic magnetron's resonated system

A6磁控管谐振系统的计算与模拟分析

So, in this work , AlN thin films were prepared by RF magnetron sputtering deposition method.

所以本文利用射频磁控溅射方法制备AlN薄膜.

TiB _ 2 and Ti-B-N coatings were prepared by magnetron sputtering on 1 Cr 18 Ni 9 Ti stainless steel.

用磁控溅射法在1Cr18Ni9Ti不锈钢上沉积了TiB2和 Ti -B-N涂层.

Fused salt electrodeposition, magnetron sputteringand chemical vapor deposition were also methods of preparing platinum composite electrode.

此外,铂电极复合方法还有熔盐电镀, 磁控溅射,化学气相沉积等,指出了各种方法的优缺点及发展方向.

The influence of TiN thin flms grown processing by magnetron sputtering

磁控溅射制备TiN薄膜影响因素的研究