polishing的例句大全

Polishing surface with elastic laing tools have higher efficiency and quality than with ball end tools.

结果表明:用弹性浮动工具机械电解抛光平缓曲面具有加工效率高,质量好的优点.

This dual-function machine provides you the versatility of both ultrasonic and mechanical polishing.

超音波及电动手机双功率输出,提供您多重功能之各种研磨及抛光功能.

The working temperature was 45-50 oC, polishing duration was 15-18 minutes.

其工作温度45～50℃、抛光时间15～18min。

The influences of polishing to the gloss, DOI, color difference of top-coat of automobiles are introduced.

介绍了抛光对汽车面漆漆膜光泽、鲜映性、色差的影响。

A process for dyeing and finishing ramie/ cotton blend towel was set forward as: kier boiling in one bath, treatment with polishing enzyme, dyeing with reactive dyes and finally softening finishing.

苎麻/棉混纺毛巾经一浴法煮漂后，进行抛光酶处理，用活性染料染色，再进行柔软整理。

The content ( by vo lume) of the former should be ≤ 0.88% for ≤ 16% cobalt alloy. Those over 0.88% in the standard photograph are pseudoimages resulting from too large particle slie of abrasive materials during polishing.

含钴量≤16%的合金中，共晶石墨的体积含量应≤c.88%，标准照片中＞0.88%的照片，是抛光时研磨料粒子太粗造成的假象；

The Chemical mechanical polishing technique in the field of semiconductor industry was introduced.

介绍了半导体工业中蓬勃发展的化学机械抛光(CMP)技术.

Finally, the development direction of polishing technology for CVD diamond thin film was forecasted.

并展望了CVD金刚石薄膜抛光技术的发展方向.

Finally, discussed are etching mechanism, polishing principles, and control of reactive versions of the InP material.

文章最后讨论了InP材料的腐蚀机理 、 抛光原理及化学反应类型的控制.

Magnetorheological jet polishing ( MJP ) is a new deterministic precision finishing technology.

磁射流抛光技术是一种新型的确定性精密抛光方法.

The effects on material removal of MJP Jet Polishing by several parameters were given.

研究了磁射流抛光时几种工艺参数对材料去除的影响.

He was busy polishing the pots and pans.

他正忙着擦拭锅盘.

Application of UFD on Polishing Surfaces with Sub nanometer Scale Roughness

应用纳米级金刚石抛光亚纳米级光滑表面

Direction: Daub the floor with it by a wax swob , and then scrub it by a polishing machine.

使用方法：用干净蜡拖，涂于地面并用抛光机抛光。

One of the branches of CCOS is the computer controlled small tool polishing.

计算机控制小工具抛光是其中的一个重要分支。

The optimum schemes in the polishing process of CCOS are discussed.

讨论了CCOS在抛光过程中的工艺技术优化方案；

However, the material can be improved, such as by cutting waste Zhukuai to fine polishing.

不过, 取材可以改良, 比如用废旧竹筷削细抛光即可.

Fabricating technology and characteristics of a new type Of WBN polishing pills

一种新型的固着磨料抛光片&WBN抛光片的制作工艺及其特性

We described in the paper a new type of polishing pill manufactured by using a rensentlysynthesized superhard ceramic powders of wurtzite-type boron nitride ( WBN).

本文描述了用冲击合成方法得到的超硬材料纤锌矿型氮化硼（WBN）制作的一种新型抛光片。

The influence of the pressure, rotate speed and polishing time on MRR is discussed in this paper.

本文讨论了硬盘片的化学机械抛光过程中的外加压力、转速和抛光时间对去除率的影响。