photoresist的例句大全

This paper reports a simple process using photoresist as sacrificial layers to fabricate movable microstructures.

报道了用光致抗蚀剂作牺牲层材料制作可动微机械结构的一种新技术.

Methacrylate photoresist was one of the tradition photoresists and it had high transparent and resolution.

甲基丙烯酸树脂光刻胶是传统的光刻胶之一,具有高度的透明性及分辨率.

The mathematics model that showed photoresist spin coating thickness evolvement on spherical surface was put forward.

提出了球面旋涂微米级厚度光刻胶膜层薄化率公式及径向位置演变公式,并得到了膜厚分布的演变公式.

In the paper diazonaphthoquinone positive photoresist composition for LCD was studied.

文章是有关用于LCD的重氮萘醌系正性抗蚀剂的研究.

Therefore, organic pigment must to be fine and symmetrical in the photoresist.

因此, 有机颜料必须以微细、均匀的状态存在于光阻剂中.

We have developed a method to measure the glass transition temperature of photoresist in situ.

我们研究出了一种方法来测量光刻胶玻璃的过渡温度.

This photoresist have thermal stabilityand high resolution.

该光刻胶具有热稳定性和高分辨率性.

This paper introduces a chemically amplified photoresist appropriate for argon ion laser direct imaging.

本文介绍一种氩离子激光直接成像化学增幅感光树脂.

Through optical film, adhesive, photoresist and Polaroid making and applies for LCD screen making, UV-applications in LCD making is introduced.

通过光学功能薄膜、粘合剂、光刻胶和偏光片等的制作和在LCD显示面板制造中的用途，介绍了辐射固化技术在液晶显示器制作中的应用。

This paper introduces a technical method of etching optical dividing disc with 302~# negative type photoresist.

本文介绍了采用302负性光刻胶刻制光学度盘的工艺方法。

Method for Controlling Groove Depth and Duty Cycle of Rectangular Photoresist Gratings

一种控制矩形光刻胶光栅槽深和占宽比的方法

Hotplate for Photoresist Baking

用于光刻胶烘干的热板的研制

The photoresist sample prepared was evaluated by SEMATECH. Its best resolution is 0.1 μ m, the minimun exposure dose is 26 mJ/ cm2; it has not only excellent resolution and photosensitivity, but also good adhesiveness and anti-dry etching.

研制出的样品经美国SEMATECH实验室应用评价其最佳分辨率为0.1μm，最小曝光量为26mJ/cm2，不但具有优异的分辨率和光敏性，而且还具有良好的粘附性和抗干法腐蚀性。

Dissolution inhibition mechanisms of positive photoresist based on novolak-dnq

酚醛-重氮萘醌正性抗蚀剂溶解抑制机理

The mechanisms of dissolution inhibition of positive photoresist based on novolak ( NVK)-diazonaphthoquinone ( DNQ), including ( 1) the molecular hydrogen bonding interactions between novolak and DNQ;

本文综述了酚醛重氮萘醌正性抗蚀剂的溶解抑制机理，主要包括（1）分子间氢键作用机理；