cmp

After the 2.2.15 cell line was planted 24 hours, CMP and Alcilovir ( ACV ) were added.

将2.2.15细胞株种板24h后, 分别加入羧甲基茯苓多糖和阳性对照药阿昔洛韦 ( ACV ) .

The presented parallel algorithms can be referred in designing CMP system and optimizing other applications.

这些算法的提出,为今后CMP系统的设计以及其他应用在CMP体系结构上的并行优化提供了参考.

Mathematical models were developed to simulate particle reduction in CMP slurry distribution systems.

为模拟cmp磨料 分配系统的粒子减少开发了数字模型.

Recent investigation shows that CeC & gt ; 2 nanoparticles can be used as CMP slurry to polish IC chip.

最新研究表明,纳米 CeO _2可用于集成电路芯片加工的化学机械抛光(CMP)浆料.

The CMP process is also used to control film thickness and removal of barrier layers.

CMP技术也用于控制薄膜厚度及剥离隔离层.

Then its CMP properties on hard disk substrate with nickel-phosphorous plated was studied.

进而研究了其在镍磷敷镀的硬盘基片CMP中 的抛光特性.

Under the optimal conditions, about 45.7 % CMP was transformed to CTP.

在最优化条件下, 转化率达45.7%.

The major problem in Cu CMP is dishing, serious dishing will cause the yield loss.

铜化学机械抛光是近些年发展最快的一种工艺,铜碟形是铜化学机械抛光工艺中的主要问题之一.

The Chemical mechanical polishing technique in the field of semiconductor industry was introduced.

介绍了半导体工业中蓬勃发展的化学机械抛光(CMP)技术.

The rates of sensitivity to aminopenicillin ( AMP ) , chloramphenicol ( CMP ) , kanamycin ( KM ) , complex sulfamethoxazole-trimethoprim ( COS ) , gentamicin ( GN ) , neomycin ( NM ), tobramycin ( TOB ) , amikacin ( AKN ) and norfloxacin ( NOR ) were high, between 84.4 % and 95.5 %.

对链霉素、痢特灵 、 羧 苄青霉素及 四环素 的耐药率较高, 在129%～457%之间, 对红霉素的耐药率高达949%.