Whole CVD process performed at room temperature, increased temperature was limited within a small local area on the surface of sample, so that the deposition keeping original properties of sample and selected area deposition were feasible, the prospects of application of CVD are improved.

  • 整个沉积过程在室温下进行,仅在试样表面局部区域有升温,从而可以实现保持基体原有性能的沉积和选区沉积,拓宽CVD的应用前景。

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