lithography的例句大全

X ray lithography ( XRL) is a very important batch exposure technology in micro/ nanometer lithography. The development of XRL requires new X ray source, new type of stepper, new X ray masks and advanced related processing technology.

X－ray光刻（XRL）是微／纳米光刻技术中至关重要的批量复制技术，XRL的发展在于不断对X－ray源、新型的stepper、X线掩模版以及相关处理工艺的研究进展。

It is well known that optical limitation is the bottle neck in traditional lithography process.

由于传统的光刻生产工艺有透镜光学极限性,压印光刻为集成电路的生产提供了一种新思路.

Relative to the metal roller and plate cylinder, block drum and nano-imprint lithography drum case might.

不绝对于金属网纹辊与印版滚筒 、 印版滚筒与压印滚筒的不张辛而言可以不详不小些.

Electron-beam lithography with a novel multilevel resist structure defines the pattern.

采用新型的多层抗蚀剂结构的电子束光刻来形成图形.

This article mainly explains the process of LIGA technology, which includes X-ray lithography,-electroforming and-copy.

本文主要阐述了LIGA技术 的工艺过程, 包括 X 射线深层光刻 、 微电铸和微复制工艺.

A process of soft lithography was introduced for fabrication of PDMS ( polydimethylsiloxane ) micro-mixer on micro-fluidic chip.

介绍了一种用软光刻技术制作微流芯片上 PDMS 微混合器的工艺.

Choice criteria on target material for soft Xray projection lithography source were proposed in this paper.

给出了用于软X射线 投影光刻的激光等离子体源靶材的选择依据.

Solution: fine-tune gripper teeth pad with Nano-imprint lithography drum edge.

处置办法: 澈底调不静递纸牙牙垫同压印滚筒外的隔断.

Intel continues to use 193-nm dry lithography at 45 nm.

intel在45nm上仍然使用193nm波长的干式光刻.

The results show that the method is effective and antinoise in measuring the laser interference lithography patterns.

测量结果证明，对于激光干涉条纹图，该方法是一种有效的测量方法并且具有较高的抗噪声性能。

The company has Heidelberg Subaru four-color, color, offset lithography, double-sided printing presses, such as printing equipment.

公司拥有海德堡速霸四色 、 双色 、 平版胶印机 、 双面印刷机 、 等印刷设备.

Nano-imprint lithography drum paper teeth spring break.

压印滚筒咬纸牙撑簧不续裂.

Lithography technique has been the key point to push forward the USL fabricator. X-ray lithography ( XRL) is one of the next generation lithography techniques ( NGL), which has the probability of industrialization.

光刻技术是推动集成电路制造业不断向前发展的关键技术，X射线光刻技术是下一代光刻技术的一种，具有产业化的应用前景。

Individual sodium titanate nanowire-based device is fabricated via e-beam lithography techniques.

利用电子束光刻技术制作了基于钛酸钠纳米线的纳米器件.

The reduction of IC feature size constantly prompts the research and development of new lithography technique.

集成电路特征尺寸的缩小,不断促进新一代光刻技术的研究和开发.

Trends of Lithography Technology Based on Decreasing of the Feature Size

从特征尺寸的缩小看光刻技术的发展

Research on Backscattered Electron Detecting Circuit of Scanning-electron-beam Lithography System

电子束曝光机背散射电子检测电路的研究

Printing by lithography; a flat surface ( of stone or metal) is treated to absorb or repel ink in the desired pattern.

用平板印刷；用来吸收或分派墨汁使它们达到理想模式的光滑平面（石制的或铁制的）。

Simulated calculation and analysis of the forbidden band for fabricating two-and three-dimensional photonic crystal structures using holographic lithography

激光全息法制作二、三维光子晶体的模拟计算及禁带分析

Blanket in Nano-imprint lithography procedure of periodic alternating stress of deformation.

橡皮布在不抬印历程洋,受到周期性接变答力的功用,爆发形变.