sputtering的例句大全

AAM offers 99.95 % ~99.995 % pure Ta sputtering Target for data storage and other thin film applications.

中精伦为数据存储和半导体行业提供高纯钽靶,产品纯度在99.95%-99.995%.

For binary target, it is shown that the preferential sputtering is independent of atomic radius.

在双元靶严格解的基础上, 证明了泽优溅射与原子的半径大小无关.

Depth crystalline evolution property for microcrystalline Si films deposited by ion beam sputtering was studied.

研究了离子束溅射制备微晶硅薄膜的生长纵向结晶演化过程.

Suddenly, the car started chugging and sputtering until finally the engine quit altogether.

忽然, 车子先是发出嘎嚓声,然后又是劈啪声,终于发动机彻底歇工了.

Methods: The nature HA films were prepared by electron beam evaporation and rf-magnetron sputtering techniques.

方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.

The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.

利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.

Ion sputtering yields on T ? Ti target are numerically calculated with TRIM program.

应用trim程序模拟了离子在氚钛靶上的溅射产额.

In the fourth chapter Sb-doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.

第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.

At present, W and W alloy are considered as a promising candidate for plasma facing material ( PFM) of International Thermonuclear Experimental Reactor ( ITER) because of their high thermal conductivity, high melting and low sputtering erosion.

目前，钨和钨合金由于良好的热传导性，高熔点，低溅射率等优良特性被普遍认为是最有希望成为国际热核聚变实验堆（ITER）等离子体面壁材料的候选材料之一。

Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.

利用低频反应磁控溅射制备五氧化二铌光学薄膜.

Magnetically controlled cathod plasma sputtering technique was used to manufacture the plating manganin film.

用磁控溅射低温沉积镀膜技术制做锰铜薄膜,能够保持薄膜中锰、铜、镍成份的相对稳定和锰铜合金正六面三元固溶体金相结构的特性.

A cerium dioxide target was used for sputtering and films were deposited at various substrate temperature under different sputtering power.

溅射过程中，首先制备纯二氧化铈靶材，然后在不同的功率上调节不同的基片温度进行溅射。

sputtering fireworks

噼啪作响的烟火

A wick was sputtering feebly in a dish of oil.

瓦油灯上结了一个大灯花,使微弱的灯光变得更加阴暗.

We can antipasti that by using magnetron-sputtering technique there is a very fine applied foreground after new generation bearing appears.

预计利用磁控溅射超细合金材料涂层技术的新一代轴瓦会有十分广阔的应用前景。

The arc lights were sputtering overhead, and high up were the lighted windows of the tall office Buildings. The chill wind whipped in and out in gusty Breaths.

弧光灯在头顶上方闪烁。更高处，写字楼的窗子里透出光明。一阵阵寒风像鞭子一样抽打着行人。

Aluminum-doped zinc oxide ( ZnO ∶ Al) films are deposited on Corning 1737 glass by RF magnetron sputtering under the substrate temperature of 250 ℃, RF power of 100W and pure argon gas.

在Corning1737玻璃衬底上射频磁控溅射沉积了铝掺杂ZnO薄膜（ZnO∶Al）.薄膜沉积在衬底温度250℃、溅射功率100W和纯氩气氛中进行。

As the sputtering pressure decreasing, the thicker of films were increased, the closer effective refractive indices of ZnO films to Crystal Refractive Indices.

溅射压强越小，薄膜越厚，薄膜的有效折射率越接近晶体材料的折射率。

Tungsten ( W) is presently a so good candidate plasma facing material for nuclear fusion reactor because of its high melting point, high thermal conductivity, low sputtering yield and low tritium retention capability.

钨具有高熔点、高导热、低溅射产额和低氚滞留性能，是核聚变堆最有希望的面对等离子体第一壁材料。