etching的例句大全

On the Convex Corner Etching of Silicon Mesa Structure

硅台面结构凸角腐蚀原因探析

Compensation technique for < 100> convex corner undercutting in KOH anisotropic etching of silicon and its application

硅KOH腐蚀<100>晶向凸角补偿技术及应用

Cupric hydroxide recovery from printed-circulit plate etching waste liquor

从印制电路板蚀刻废液中回收氢氧化铜

Etching printing of circuit boards and electrolytic regeneration of spent cupric chloride etchant

印制电路板的刻蚀及刻蚀液电解再生的闭路循环工艺研究

The preparation of cuprous chloride from etching waste liquor of cupric chloride and crude copper powder was studied. The result showed that this method had many advantages, including simple process, easy operation and good quality of product, therefore it had remarkable economic and environmental benefits.

以氯化铜蚀刻液废液、粗铜粉等为原料，在常温下反应制备氯化亚铜，工艺简单，操作简便，产品质量好，具有显著的经济效益和环境效益。

In the paper, it shows a wearing test for 28 Cr cast iron and diabase under difference scour-etching an-gles.

通过对28Cr铸铁与辉绿岩铸石两种材料在不同冲蚀角度下的磨损试验以及对其磨损面的微观分析，比较了两种材质冲蚀磨损特性。

This paper introduces a technical method of etching optical dividing disc with 302~# negative type photoresist.

本文介绍了采用302负性光刻胶刻制光学度盘的工艺方法。

Higher self biasing voltage increases ion bombardment energy and densities of oxygen atoms/ ions, which is a key factor for etching.

基底直流自偏压的提高能增强离子轰击效应和增加氧原子/氧离子密度，因而是决定刻蚀速率的一个关键因素。

Freeze Fracture Etching Study of Tight Junctions in Bile Canaliculus

毛胆管紧密连接的冷冻蚀刻研究

The new method of producing basic copper carbonate from waste etching solution containing copper.

介绍了利用含铜蚀刻废液合成碱式碳酸铜的新工艺.

Simulation for Etching Diffraction Grating by Use of Scalar Diffraction Theory

标量衍射理论模拟蚀刻衍射光栅

Preparation of Basic Copper Carbonate from Waste Etching Solution Containing Copper of Electronic Industry

利用含铜蚀刻废液生产碱式碳酸铜

This paper reports the etching experiments of BBO crystal with etchants , such as organic solutions, water, acid and base.

本文报道了BBO晶体在有机溶剂 、 水和酸碱等腐蚀液中的腐蚀实验结果.

The three-in-one combination technology -- electrochemical polishing, mechanical polishing and electrochemical etching punching are introduced.

介绍了一种先进的电化学抛光 、 常规的机械抛光和电化学蚀刻打标三合一技术.

On the basis of the exploration of the wet etching technology in micro-machining ceramic materials, the excimer laser micro-machining technique is determined, by which batches of ceramic hotplates with different structural parameters are produced successfully.

在对湿法腐蚀微加工陶瓷材料工艺方法探索的基础上，确定了准分子激光微加工的技术路线，用该方法制作了不同结构参数的陶瓷微热板器件。

The photoresist sample prepared was evaluated by SEMATECH. Its best resolution is 0.1 μ m, the minimun exposure dose is 26 mJ/ cm2; it has not only excellent resolution and photosensitivity, but also good adhesiveness and anti-dry etching.

研制出的样品经美国SEMATECH实验室应用评价其最佳分辨率为0.1μm，最小曝光量为26mJ/cm2，不但具有优异的分辨率和光敏性，而且还具有良好的粘附性和抗干法腐蚀性。

Finally, discussed are etching mechanism, polishing principles, and control of reactive versions of the InP material.

文章最后讨论了InP材料的腐蚀机理 、 抛光原理及化学反应类型的控制.

This paper has Studied anisotropic etching mechanism of St in KOH scution by using collision theory.

本文应用碰撞理论研究了硅在KOH溶液中各向异性腐蚀的机理.

This paper investigated the law of KPB crystal twinning using microcrystallography, chemical etching and optical method.

本文采用显微结晶、化学浸蚀和光学方法研究了KPB晶体的孪生规律。

Use chemical etching method.

首先采用化学腐蚀法.